減少(shao)側蝕和突沿，提高蝕刻系數

側(ce)蝕(shi)(shi)產生突沿(yan)。通常印制(zhi)(zhi)(zhi)板在蝕(shi)(shi)刻液中的時間(jian)越長，（或(huo)者(zhe)使用老(lao)式(shi)的左右(you)搖擺蝕(shi)(shi)刻機）側(ce)蝕(shi)(shi)越嚴重(zhong)。側(ce)蝕(shi)(shi)嚴重(zhong)影響印制(zhi)(zhi)(zhi)導線的精度，嚴重(zhong)側(ce)蝕(shi)(shi)將使制(zhi)(zhi)(zhi)作(zuo)精細導線成為(wei)(wei)不(bu)可能(neng)。當側(ce)蝕(shi)(shi)和突沿(yan)降(jiang)低時，蝕(shi)(shi)刻系數就升高(gao)，高(gao)的蝕(shi)(shi)刻系數表示有保持細導線的能(neng)力(li)，使蝕(shi)(shi)刻后的導線接近原圖尺寸。電(dian)鍍蝕(shi)(shi)刻抗(kang)蝕(shi)(shi)劑(ji)無論(lun)是錫－鉛合(he)金，錫，錫－鎳(nie)合(he)金或(huo)鎳(nie)，突沿(yan)過度都會造成導線短(duan)路(lu)。因為(wei)(wei)突沿(yan)容易(yi)斷裂下來，在導線的兩(liang)點(dian)之(zhi)間(jian)形成電(dian)的橋接。

提(ti)高(gao)板子與板子之間蝕(shi)刻速率的一(yi)致性(xing)

在連續的(de)板子蝕刻(ke)(ke)(ke)中，蝕刻(ke)(ke)(ke)速率(lv)越一致，越能獲得(de)均勻蝕刻(ke)(ke)(ke)的(de)板子。要(yao)達(da)到這一要(yao)求，必須保證(zheng)蝕刻(ke)(ke)(ke)液(ye)在蝕刻(ke)(ke)(ke)的(de)全(quan)過程始終保持在佳的(de)蝕刻(ke)(ke)(ke)狀態。這就要(yao)求選擇容易再生和補償，蝕刻(ke)(ke)(ke)速率(lv)容易控(kong)(kong)制的(de)蝕刻(ke)(ke)(ke)液(ye)。選用(yong)能提供恒定的(de)操作條件和對各種溶(rong)(rong)液(ye)參數能自動控(kong)(kong)制的(de)工藝和設備。通過控(kong)(kong)制溶(rong)(rong)銅量，PH值，溶(rong)(rong)液(ye)的(de)濃(nong)度(du)，溫度(du)，溶(rong)(rong)液(ye)流量的(de)均勻性(噴(pen)淋(lin)系統(tong)或噴(pen)嘴以及噴(pen)嘴的(de)擺動)等來實現。

提高整個(ge)板子(zi)表(biao)面(mian)蝕刻(ke)速(su)率(lv)的(de)均勻性

板(ban)(ban)(ban)(ban)(ban)(ban)(ban)子上下(xia)兩面(mian)(mian)(mian)以及(ji)板(ban)(ban)(ban)(ban)(ban)(ban)(ban)面(mian)(mian)(mian)上各個(ge)部(bu)位的(de)(de)(de)(de)(de)蝕(shi)(shi)刻(ke)(ke)均勻(yun)性是由板(ban)(ban)(ban)(ban)(ban)(ban)(ban)子表面(mian)(mian)(mian)受到(dao)蝕(shi)(shi)刻(ke)(ke)劑流量的(de)(de)(de)(de)(de)均勻(yun)性決定的(de)(de)(de)(de)(de)。蝕(shi)(shi)刻(ke)(ke)過程(cheng)中(zhong)，上下(xia)板(ban)(ban)(ban)(ban)(ban)(ban)(ban)面(mian)(mian)(mian)的(de)(de)(de)(de)(de)蝕(shi)(shi)刻(ke)(ke)速率(lv)往(wang)(wang)往(wang)(wang)不一(yi)(yi)致(zhi)。一(yi)(yi)般(ban)來(lai)說，下(xia)板(ban)(ban)(ban)(ban)(ban)(ban)(ban)面(mian)(mian)(mian)的(de)(de)(de)(de)(de)蝕(shi)(shi)刻(ke)(ke)速率(lv)高于上板(ban)(ban)(ban)(ban)(ban)(ban)(ban)面(mian)(mian)(mian)。因(yin)為上板(ban)(ban)(ban)(ban)(ban)(ban)(ban)面(mian)(mian)(mian)有溶液的(de)(de)(de)(de)(de)堆(dui)積，減弱了蝕(shi)(shi)刻(ke)(ke)反應的(de)(de)(de)(de)(de)進行。可(ke)以通過調整(zheng)上下(xia)噴(pen)嘴的(de)(de)(de)(de)(de)噴(pen)啉壓力來(lai)解決上下(xia)板(ban)(ban)(ban)(ban)(ban)(ban)(ban)面(mian)(mian)(mian)蝕(shi)(shi)刻(ke)(ke)不均的(de)(de)(de)(de)(de)現象。蝕(shi)(shi)刻(ke)(ke)印制(zhi)板(ban)(ban)(ban)(ban)(ban)(ban)(ban)的(de)(de)(de)(de)(de)一(yi)(yi)個(ge)普遍(bian)問題是在(zai)相同時間(jian)(jian)里使(shi)全部(bu)板(ban)(ban)(ban)(ban)(ban)(ban)(ban)面(mian)(mian)(mian)都蝕(shi)(shi)刻(ke)(ke)干(gan)凈是很難(nan)做到(dao)的(de)(de)(de)(de)(de)，板(ban)(ban)(ban)(ban)(ban)(ban)(ban)子邊(bian)緣(yuan)比板(ban)(ban)(ban)(ban)(ban)(ban)(ban)子中(zhong)心部(bu)位蝕(shi)(shi)刻(ke)(ke)的(de)(de)(de)(de)(de)快(kuai)。采用噴(pen)淋系統并(bing)使(shi)噴(pen)嘴擺動是一(yi)(yi)個(ge)有效的(de)(de)(de)(de)(de)措(cuo)施。更進一(yi)(yi)步(bu)的(de)(de)(de)(de)(de)改(gai)善可(ke)以通過使(shi)板(ban)(ban)(ban)(ban)(ban)(ban)(ban)中(zhong)心和板(ban)(ban)(ban)(ban)(ban)(ban)(ban)邊(bian)緣(yuan)處的(de)(de)(de)(de)(de)噴(pen)淋壓力不同，板(ban)(ban)(ban)(ban)(ban)(ban)(ban)前(qian)沿和板(ban)(ban)(ban)(ban)(ban)(ban)(ban)后端間(jian)(jian)歇蝕(shi)(shi)刻(ke)(ke)的(de)(de)(de)(de)(de)辦法，達到(dao)整(zheng)個(ge)板(ban)(ban)(ban)(ban)(ban)(ban)(ban)面(mian)(mian)(mian)的(de)(de)(de)(de)(de)蝕(shi)(shi)刻(ke)(ke)均勻(yun)性